Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition |
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| Authors: | M. Knez K. Nielsch L. Niinistö |
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| Affiliation: | 1. Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle (Germany);2. Institute of Applied Physics, University of Hamburg, Jungiusstr. 11, 20335 Hamburg (Germany);3. Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, 02015 Helsinki (Finland) |
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| Abstract: | Atomic layer deposition (ALD) has recently become the method of choice for the semiconductor industry to conformally process extremely thin insulating layers (high‐k oxides) onto large‐area silicon substrates. ALD is also a key technology for the surface modification of complex nanostructured materials. After briefly introducing ALD, this Review will focus on the various aspects of nanomaterials and their processing by ALD, including nanopores, nanowires and ‐tubes, nanopatterning and nanolaminates as well as low‐temperature ALD for organic nanostructures and biomaterials. Finally, selected examples will be given of device applications, illustrating recent innovative approaches of how ALD can be used in nanotechnology. |
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| Keywords: | Atomic layer deposition Nanostructures Photonic crystals |
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