Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning |
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| Authors: | F Pfeiffer N M Felix C Neuber C K Ober H‐W Schmidt |
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| Affiliation: | 1. Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and , Bayreuther Zentrum für Kolloide und Grenzfl?chen (BZKG), Universit?t Bayreuth, 95440 Bayreuth (Germany);2. Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853 (USA) |
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| Abstract: | A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent‐free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub‐micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized. |
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| Keywords: | Hybrid materials Lithography Patterning Photoresists Physical vapor deposition |
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