| 高功率CO2激光薄膜的离子辅助镀工艺进展 |
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| 引用本文： | 迟晓丽,夏文建. 高功率CO2激光薄膜的离子辅助镀工艺进展[J]. 激光杂志, 2003, 24(4): 4-7 |
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| 作者姓名： | 迟晓丽 夏文建 |
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| 作者单位： | 迟晓丽（华中科技大学激光技术国家重点实验室,武汉,430074）;夏文建（华中科技大学激光技术国家重点实验室,武汉,430074） |
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| 摘 要： | 真空蒸发镀膜技术已经应用了很多年，随着激光技术的发展，人们对激光薄膜尤其是高功率激光薄膜的质量要求越来越高，离子辅助沉积薄膜技术已被广泛用来作为一种改善光学薄膜特性的工艺手段。本文简单地介绍了这项技术的原理及国内外研究现状；总结了该技术的优、缺点；客观评价了该技术的应用前景；对该技术今后的研究方向提出了建议。
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| 关 键 词： | 高功率 光学薄膜，离子辅助镀 二氧化碳激光器 真空蒸发镀膜 |
| 修稿时间： | 2003-03-12 |
The development of the ion-assisted deposition of high power CO2 laser thin films |
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| Chi Xiaoli Xia Wenjian. The development of the ion-assisted deposition of high power CO2 laser thin films[J]. Laser Journal, 2003, 24(4): 4-7 |
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| Authors: | Chi Xiaoli Xia Wenjian |
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| Abstract: | The vacuum vapor plating technology has been used for many years.Along with the development of laser technology,the demand for optical films,especially high power laser films are becoming higher and higher.The ion-assisted depositing technology has been used to modify the characters of optical films.The theory and the status quo including the studying abroad and home were briefly described.The advantages,shortcomings and prospect of its utility were summarized.Some proposal was suggested. |
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| Keywords: | optical film ion-assisted deposition(IAD) survey |
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