| Cr掺杂ZnO薄膜晶体结构及光学性能的研究 |
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| 引用本文： | 付长凤,韩连福,刘超,陈希明. Cr掺杂ZnO薄膜晶体结构及光学性能的研究[J]. 材料导报, 2010, 24(22) |
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| 作者姓名： | 付长凤 韩连福 刘超 陈希明 |
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| 作者单位： | 东北石油大学电子科学学院,大庆,163318;天津理工大学电子信息工程学院薄膜电子与通信器件重点实验室,天津,300191 |
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| 基金项目： | 黑龙江省归国留学基金，天津市自然科学基金 |
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| 摘 要： | 采用磁控溅射法在载玻片上制备了不同Cr掺杂浓度的ZnO薄膜,并对其紫外发光性能做了初步研究.XRD结果表明,所制备的样品具有纤锌矿结构,呈c轴择优取向生长;透射谱表明,改变Cr掺杂浓度可以使ZnO薄膜的吸收边向短波方向移动,并且薄膜的禁带宽度连续可调;光致发光(PL)谱表明,所有样品的PL谱由发光中心位于370nm的紫外发光峰组成,且该峰的峰位蓝移,与吸收边缘移动的结果吻合.2.0%(原子分数,下同)的Cr掺杂可以提高ZnO的紫外发光强度,而过量的Cr掺杂反而会降低其紫外发光强度.
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| 关 键 词： | Cr掺杂 ZnO薄膜 蓝移 磁控溅射法 |
Studies on Structure and Optical Properties of Cr-doped ZnO Thin Films |
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| FU Changfeng,HAN Lianfu,LIU Chao,CHEN Ximing. Studies on Structure and Optical Properties of Cr-doped ZnO Thin Films[J]. Materials Review, 2010, 24(22) |
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| Authors: | FU Changfeng HAN Lianfu LIU Chao CHEN Ximing |
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| Affiliation: | FU Changfeng1,HAN Lianfu1,LIU Chao1,CHEN Ximing2(1 College of Electronic Science,Northeast Petroleum University,Daqing 163318,2 Tianjin Key Laboratory of Film Electronicand Communication Device,School of Electronic Information Engineering,Tianjin University of Technology,Tianjin 300191) |
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| Abstract: | Cr-doped ZnO thin films have been deposited on glass substrates using magnetron sputtering method.The compositions,crystallographic structures and optical properties of the thin films are investigated by means of energy dispersive X-ray photoelectron spectrum,X-ray diffraction and PL spectra,respectively.The results show that the sputtered thin films with a preferential c-axis orientation exhibit the wurtzite structure.Optical transmittance properties display that the absorption edges of Cr-doped ZnO films ... |
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| Keywords: | Cr-doping ZnO thin film blue shift magnetron sputtering method |
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