复合澄清剂在TFT基板玻璃熔制过程中的作用机理

针对当前薄膜晶体管(TFT)基板玻璃熔制过程中澄清剂作用机理认识不足的问题,采用模拟TFT基板玻璃浮法熔制工艺与高温熔融动态观察相结合的方式,研究了SnO₂、CaSO₄、NaCl等单一和复合澄清剂在熔制过程中的适用温度、澄清效果等,对基板玻璃热学性能、玻璃块体中Na⁺含量与NaCl澄清剂使用量的关系进行探讨。结果表明:SnO₂单一澄清剂的适宜用量为0.10%(质量分数);复合澄清剂中0.10%(质量分数)SnO₂+0.35%(质量分数)CaSO₄形成的梯度澄清效果最佳;复合澄清剂SnO₂+NaCl构成协同澄清,澄清效果随NaCl用量的增加而提高,但NaCl澄清剂的使用量应不高于0.076 3%(质量分数),以满足基板玻璃对残留碱金属离子含量的严格要求。以上研究成果对改善TFT基板玻璃熔制质量和产品品质具有重要的参考意义,有利于相关工业化生产降本增效。

Mechanism of Compound Refining Agents for TFT Substrate Glass Melting Process

Aiming to better understand the mechanism of refining agents for thin film transistor (TFT) substrate glass melting process, the proper temperature and refining effect of SnO₂, CaSO₄, NaCl and their compounds in melting process were studied by simulating float melting technology of TFT substrate glass. A high temperature melting dynamic observation was also used to study the detailed melting process. The effect of the NaCl amount used on the thermal properties of glass and the residual Na⁺ content in glass was discussed. The results show that the appropriate amount of SnO₂ is 0.10% (mass fraction) as a single refining agent. The further investigations on the compound refining agents indicate that the gradient clarification composed of 0.10% (mass fraction) SnO₂ and 0.35% (mass fraction) CaSO₄ has the best refining performance. For the synergy clarification composed of SnO₂ and NaCl, the refining performance increases with the increase of the amount of NaCl, but it should not exceed 0.076 3% (mass fraction) to satisfy the strict requirements of TFT substrate glass. The above research results offer important information for improving melting technology and product quality of TFT substrate glass, and they are beneficial to reduce cost and increase efficiency for the related industrial production.