| 6063铝合金氧化膜与CsF-AlF3及KF-AlF3钎剂的反应机制 |
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| 引用本文： | 朱宏,薛松柏,盛重.6063铝合金氧化膜与CsF-AlF3及KF-AlF3钎剂的反应机制[J].焊接学报,2009,30(9):13-16,20. |
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| 作者姓名： | 朱宏 薛松柏 盛重 |
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| 作者单位： | 1. 南京航空航天大学材料科学与技术学院,南京210016;中国电子科技集团第十四研究所,南京210013
2. 南京航空航天大学材料科学与技术学院,南京,210016 |
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| 基金项目： | 精密焊接专家系统及复合焊接技术国家基础研究项目 |
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| 摘 要： | 选用CsF-AlF3和KF-AlF3钎剂,研究了两种钎剂在6063铝合金表面不同温度下的去膜效果,并分析和探讨了钎剂与6063铝合金表面氧化膜的反应机制.研究发现,CsF-AlF3,钎剂是以反应、溶解的机制去除6063铝合金表面氧化膜的,NHIF在高温下生成的HF是CsF-AlF3钎剂去膜的关键化合物.此外,H2O的存在或形成促进了HF的生成,从而加速了钎剂的去膜进程.CsF-AlF3,,钎剂反应产物中没有发现CsF和AlF3,只有少量的CsAlF4存在.在570℃下,KF-AlF3钎剂反应产物中以KAlF4为主,而在610℃条件下,KAlF4已不存在,只有少量的KMgF3生成.结果表明,在610℃条件下,Mg,Mn元素和KAlF4将逐渐地消耗掉,使得钎剂熔点急剧升高,导致钎剂流动性变差.
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| 关 键 词： | 6063铝合金 氧化膜 钎剂 反应产物 |
| 收稿时间： | 2009/5/14 0:00:00 |
Mechanism of CsF-AlF3 and KF-AlF3 fluxes reacting with oxide films of 6063 aluminum alloy |
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| ZHU Hong,XUE Songbai and SHENG Zhong.Mechanism of CsF-AlF3 and KF-AlF3 fluxes reacting with oxide films of 6063 aluminum alloy[J].Transactions of The China Welding Institution,2009,30(9):13-16,20. |
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| Authors: | ZHU Hong XUE Songbai and SHENG Zhong |
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| Affiliation: | ZHU Hong1,2,XUE Songbai1,SHENG Zhong1(1.College of Materials Science and Technology,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China,2.14th Research Institute,China Electronic Technology Group Corporation,Nanjing 210013,China) |
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| Abstract: | CsF-AlF3 flux and KF-AmF3 fluxes were selected,the effects of removing the oxides on the surface of 6063 aluminum alloy by these two fluxes were studied at different temperatures,and then the reaction mechanism between flux and surface oxide film of 6063 aluminum alloy was analyzed and discussed.It is discoved that the oxide film on the surface of 6063 aluminum alloy was removed by CsF-AlF3 flux in a reacting and/or dissoluting way,and the HF formed at high temperature from NH4F was the critical compounds e... |
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| Keywords: | 6063 Al alloy oxide film flux residua |
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