Compositional changes in erbium-implanted GaN films due to annealing |
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Authors: | J M Zavada R G Wilson U Hömmerich M Thaik J T Seo C J Ellis J Y Lin H X Jiang |
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Affiliation: | (1) U.S. Army Research Office, 27709 Durham, NC;(2) 91381 Stevenson Ranch, CA;(3) Hampton University, 23668 Hampton, VA;(4) Kansas State University, 66506 Manhattan, KS |
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Abstract: | We have conducted a study of the material and infrared-luminescence properties of Er-implanted GaN thin films as a function
of annealing. The GaN films, grown by metal-organic chemical-vapor deposition, were coimplanted with Er and O ions. After
implantation, the films were furnace annealed at temperatures up to 1,100°C. Following each annealing stage, the samples were
examined by photoluminescence (PL) measurements and secondary ion-mass spectrometry (SIMS) analysis. In the as-implanted samples,
no PL signal near 1,540 nm could be detected with either above-bandgap or below-bandgap excitation. Only after annealing at
temperatures above 900°C was the 1,540-nm luminescence detectable. Annealing at higher temperatures resulted first in an increase
and then a decrease in the PL-signal intensities. The SIMS data showed that large concentrations of Al, O, and C atoms entered
into the GaN films with high-temperature annealing. The stoichiometric changes in the GaN appear responsible for the changes
in the Er-related luminescence. |
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Keywords: | GaN erbium implantation annealing photoluminescence SIMS |
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