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Backgatting effect in GaAs FETs with a channel–semi-insulating substrate boundaryAhmed Chaouki Megherbi a,*, Said Benramache b, Abderrazak Guettaf a
作者姓名:Said
摘    要:This study focuses on modeling the effects of deep hole traps, mainly the effect of the substrate(backgating effect) in a GaAs transistor MESFT. This effect is explained by the existence, at the interface, of a space charge zone. Any modulation in this area leads to response levels trapping the holes therein to the operating temperature. We subsequently developed a model treating the channel substrate interface as an N–P junction, allowing us to deduce the time dependence of the component parameters of the total resistance R ds, the pinch-off voltage V P, channel resistance, fully open R co and the parasitic series resistance R S to bind the effect trap holes H1and H0. When compared with the experimental results, the values of the R DS(t S/ model for both traps show that there is an agreement between theory and experiment; it has inferred parameter traps, namely the density and the time constant of the trap. This means that a space charge region exists at the channel–substrate interface and that the properties can be approximated to an N–P junction.

关 键 词:砷化镓场效应管  绝缘衬底  通道  空间电荷区  边界  砷化镓晶体管  模型处理  沟道电阻
收稿时间:2013/9/20 0:00:00
修稿时间:2013/10/27 0:00:00

Backgating effect in GaAs FETs with a channel-semi-insulating substrate boundary
Said.Backgating effect in GaAs FETs with a channel-semi-insulating substrate boundary[J].Chinese Journal of Semiconductors,2014,35(3):034004-6.
Authors:Said
Affiliation:Electrical Engineering Department, Faculty of Technology, University of Biskra, Algeria;Material Sciences Department, Faculty of Sciences, University of Biskra, Algeria;Electrical Engineering Department, Faculty of Technology, University of Biskra, Algeria
Abstract:This study focuses on modeling the effects of deep hole traps, mainly the effect of the substrate (backgating effect) in a GaAs transistor MESFT. This effect is explained by the existence, at the interface, of a space charge zone. Any modulation in this area leads to response levels trapping the holes therein to the operating temperature. We subsequently developed a model treating the channel substrate interface as an N-P junction, allowing us to deduce the time dependence of the component parameters of the total resistance Rds, the pinch-off voltage VP, channel resistance, fully open Rco and the parasitic series resistance RS to bind the effect trap holes H1 and H0. When compared with the experimental results, the values of the RDS (tS) model for both traps show that there is an agreement between theory and experiment; it has inferred parameter traps, namely the density and the time constant of the trap. This means that a space charge region exists at the channel-substrate interface and that the properties can be approximated to an N-P junction.
Keywords:traps  pinch-off voltage  resistance  channel substrate interface
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