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Ferroelectrically Gated Atomically Thin Transition‐Metal Dichalcogenides as Nonvolatile Memory
Authors:Changhyun Ko  Yeonbae Lee  Yabin Chen  Joonki Suh  Aslihan Suslu  James David Clarkson  Hwan Sung Choe  Sefaatin Tongay  Ramamoorthy Ramesh  Junqiao Wu
Affiliation:1. Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, USA;2. School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, AZ, USA;3. Department of Physics, University of California, Berkeley, Berkeley, CA, USA;4. Materials Sciences DivisionLawrence Berkeley National Laboratory, Berkeley, CA, USA
Abstract:
Keywords:2D materials  ferroelectrics  field‐effect transistors  nonvolatile memory  transition‐metal dichalcogenides
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