应用等离子体离子辅助技术沉积的锗基底红外减反射膜

红外光学系统大多数均采用锗作为透镜和窗口的材料，由于其折射率高达４．０，引起的反射损失较大，降低了红外光能量的透过率和红外成像系统的能力。为了减少锗表面的反射损失，我们研制了高性能的红外减反射膜，使锗透镜的红外透射率高达９８％ 以上。通过等离子体离子辅助沉积技术的应用，获得了耐久性能优异的红外减反射膜，满足了杜瓦瓶封接钎焊工艺对窗口膜层的苛求，也满足了红外热像仪系统对膜层的要求，而且所有膜层均无放射性

IR Antireflection Coatings on Ge Deposited by APS IAD

It is reported that high performance IR antireflection coating has been developed, which was used to reduce reflection loss on Ge surface. Its transmittance is more than or equal to 98% at 7.5～11.5 micron band. Due to application of APS (Advanced Plasma Source) Ion Assisted Deposition technique, durable IR coatings developed meet strict requirements demanded by Dewar windows’ soldering technique. All of IR coatings are non radioactive,and can also be used in IR thermal imaging system.