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聚酰亚胺气相沉积聚合的研究进展
引用本文:浦鸿汀,王永星. 聚酰亚胺气相沉积聚合的研究进展[J]. 高分子材料科学与工程, 2005, 21(5): 5-9
作者姓名:浦鸿汀  王永星
作者单位:同济大学材料学院功能高分子所,上海,200092;同济大学材料学院功能高分子所,上海,200092
摘    要:综述了一种新的制备聚酰亚胺(PI)薄膜的方法——气相沉积聚合(VDP)的研究进展,用此方法制砰的聚合物膜具有纯度高、膜厚可控、可实现保形涂敷、可制备难溶难熔聚合物、集聚合与成膜为一体等比点。讨论了单体种类、气化温度、真空度、沉积基质、沉积时间和酰亚胺化的温度、压力、时间等对PI的VDP过程的影响,展望了VDP法制得的PI薄膜的主要应用领域。

关 键 词:气相沉积聚合  聚酰亚胺  影响因素  应用
文章编号:1000-7555(2005)05-0005-05
收稿时间:2004-06-10
修稿时间:2004-09-23

RECENT ADVANCE IN VAPOR DEPOSITION POLYMERIZATION OF POLYIMIDES
PU Hong-ting,WANG Yong-xing. RECENT ADVANCE IN VAPOR DEPOSITION POLYMERIZATION OF POLYIMIDES[J]. Polymer Materials Science & Engineering, 2005, 21(5): 5-9
Authors:PU Hong-ting  WANG Yong-xing
Abstract:Recent progress of vapor deposition polymerization(VDP) for the preparation of polyimide films was reviewed. High purity, controllable thickness, capability of synthesizing for insoluble and infusible polymers, and integration of synthesis process and fabrication process are all the prominent advantages of this technique. Effects of temperature, pressure, and time, etc, on the deposition and imidization process were discussed. The applications of PI films prepared by VDP method were viewed.
Keywords:vapor deposition polymerization ~ polyimide ~ influence ~ application
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