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Etching and chemical mechanical polishing of ZnSe using inorganic acids
Authors:E. Yu. Vilkova  O. V. Timofeev
Affiliation:1.Institute of Chemistry of High-Purity Substances,Russian Academy of Sciences,Nizhni Novgorod,Russia;2.Lobachevsky State University,Nizhni Novgorod,Russia
Abstract:The etching behavior of zinc selenide has been studied at temperatures from 20 to 90°C in inorganic acid solutions of different concentrations, with additions of H2O2 as an oxidant. The kinetic data obtained have been used to identify the mechanisms of the reactions involved and develop a chemical mechanical polishing procedure for polycrystalline zinc selenide.
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