Thermally-induced optical property changes of sputtered PdOx films |
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Authors: | T. Arai T. Shima T. Nakano J. Tominaga |
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Affiliation: | Center for Applied Near-Field Optics Research (CAN-FOR), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba 305-8562, Japan |
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Abstract: | Optical property changes of reactively sputtered palladium oxide (PdOx) thin films during heating have been investigated by light transmission measurements and in situ Raman spectroscopy, combined with X-ray fluorescence and thermogravimetry analysis (TGA). The composition ratio and refractive index of as-deposited PdOx films varies depending on the oxygen gas-flow ratio during sputtering deposition. The transmitted light intensity at wavelengths of 405 and 635 nm measured during heating up to 1000 °C in air exhibits a sharp leap at 832 °C due to the thermal decomposition of PdO, and shows a gradual increase around 200-300 °C. The decomposition process of PdO is also measured by TGA as a significant weight loss of the sample. In situ Raman spectra of sputtered PdOx film obtained during heating up to 600 °C in air demonstrate that the crystallization of PdO starts above 200 °C and progresses during the whole annealing process. |
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Keywords: | Palladium oxide Sputtering Optical properties Raman scattering |
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