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Ultra-low-stress thin-film interference filters
Authors:Ockenfuss Georg J  Klinger Robert E
Affiliation:JDS Uniphase, 2789 Northpoint Parkway, Santa Rosa, California 95407, USA. georg.ockenfuss@jdsu.com
Abstract:A method to reduce the optical degrading effect of coating stress in a thin-film filter by releasing the filter from the substrate on which it was deposited is described. An extremely challenging 8-skip-0 100 GHz wavelength-division-multiplexing band-splitting filter is demonstrated.
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