| 自支撑同位素铬靶的制备方法 |
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| 引用本文： | 罗兴华,许国基. 自支撑同位素铬靶的制备方法[J]. 原子能科学技术, 1986, 0(4) |
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| 作者姓名： | 罗兴华 许国基 |
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| 作者单位： | 中国原子能科学研究院 北京(罗兴华)，中国原子能科学研究院 北京(许国基) |
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| 摘 要： | 一、引言核物理实验需要各种厚度的自支撑同位素铬靶,首先我们用电镀法试制成0.5—2mg/cm~2的自支撑铬靶,为了获得更薄的自支撑铬靶,我们改用真空蒸发法进行试验,制成了厚度为0.2—0.4 mg/cm~2的自支撑铬靶。
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| 关 键 词： | 电镀 真空蒸发 还原蒸馏 退火 自支撑 |
THE METHODS OF PREPARATION OF SELF-SUPPORTING CHROMIUM TARGETS |
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| LUO XINGHUA,XU GUOJI Institute of Atomic Energy,P. O. Box ,Beijing. THE METHODS OF PREPARATION OF SELF-SUPPORTING CHROMIUM TARGETS[J]. Atomic Energy Science and Technology, 1986, 0(4) |
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| Authors: | LUO XINGHUA XU GUOJI Institute of Atomic Energy P. O. Box Beijing |
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| Affiliation: | LUO XINGHUA,XU GUOJI Institute of Atomic Energy,P. O. Box 275,Beijing |
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| Abstract: | The preparation of isotopically enriched self--supporting chromium targets witha thickness between 0.2 and 2 mg/cm~2 using vacuum evaporation and electropla--ting is described. The yields are about 20% and 45% for vacuum evaporation andelectroplating respectively. |
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| Keywords: | Electroplating Vacuum evaporation Reduction-distillation Annealing Self-supporting |
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