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Microanalytical investigation of sintered SiC
Authors:R. Hamminger  G. Grathwohl  F. Thümmler
Affiliation:1. Institut für Werkstoffkunde II, Kernforschungszentrum Karlsruhe, Institut für Material- und Festk?rperforschung, Universit?t Karlsruhe, Postfach 36 40, D-7500, Karlsruhe 1, West Germany
Abstract:UHV-fracture surfaces of different (B, C)- and (Al, C)-doped pressureless sintered SiC materials are investigated by using high resolution Auger electron spectroscopy (HRAES). The grain boundaries at intergranular fractured regions of (B, C)-doped materials are evidently free of any enrichment of impurity elements or sintering additives. In contrast, the (Al, C)-doped materials reveal the existence of thin Al-containing grain boundary films. Sputtering indicates their thickness to be less than 1 nm. The concentrations of the elements segregated in the grain boundary films are determined.
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