| 基于FPGA的电子束曝光机工件台控制器设计 |
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| 引用本文： | 李勇滔,韩立,薛虹,殷伯华,刘俊标.基于FPGA的电子束曝光机工件台控制器设计[J].电子工业专用设备,2009,38(4):19-24. |
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| 作者姓名： | 李勇滔 韩立 薛虹 殷伯华 刘俊标 |
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| 作者单位： | 1. 中国科学院电工研究所,北京100190;中国科学院研究生院,北京100049
2. 中国科学院电工研究所,北京,100190 |
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| 摘 要： | 基于激光干涉仪的精密工件台是电子束曝光机的关键设备。为了改进工件台控制器的运算速度．设计了一种基于FPGA的电子束曝光机工件台控制器。本控制器由上位机接口、激光干涉仪测量系统接口、电机控制接口、手动面板接口和主处理器组成，以美国Xilinx公司Spantan3系列的FPGA芯片XC3s400为核心。实现控制器与上位机、激光干涉仪测量系统、伺服驱动系统、手动控制面板之间的数据交换和指令传递。完成工件台的精确移动。满足电子束曝光的定位精度和拼接精度的要求。
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| 关 键 词： | 现场可编程门阵列 电子束曝光 工件台控制器 |
E-beam Lithography Stage Controller Design Based on FPGA |
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| LI YongTao,HAN Li,XUE Hong,YIN Bohua,LIU Junbiao.E-beam Lithography Stage Controller Design Based on FPGA[J].Equipment for Electronic Products Marufacturing,2009,38(4):19-24. |
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| Authors: | LI YongTao HAN Li XUE Hong YIN Bohua LIU Junbiao |
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| Affiliation: | LI YongTao , HAN Li, XUE Hong, YIN Bohua, LIU Junbiao (1. Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China; 2. Graduate School of Chinese Academy of Sciences, Beijing 100049; China) |
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| Abstract: | Precision stage based on laser interferometer is the key equipment in the E-beam lithography system. In order to improve the calculating speed of stage controller, a E-beam lithography stage con-troller based on FPGA is presented. This controller consists of PC interface, laser interferometer inter-face, motor controller interface, manual panel interface and main processor. US Xilinx Inc. Spantan3 series FPGA chip XC3s400 is the central unit in the controller. The controller can deliver data and command to PC, laser interferometer, servo driver system and manual panel, implement the precision move of the stage, and meet the requirement of orientation accuracy and assembly accuracy in E-beam lithography. |
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| Keywords: | Field Programmable Gate Array(FPGA) E-beam lithography Stage Controller |
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