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氡标准室中浓度智能控制系统的实现
引用本文:周伟,方方,郑永明,阎萍,刘易.氡标准室中浓度智能控制系统的实现[J].核电子学与探测技术,2007,27(4):713-715.
作者姓名:周伟  方方  郑永明  阎萍  刘易
作者单位:成都理工大学核自院,成都,610059
摘    要:介绍了一种新型的采用AVR单片机作为主控器的氡室浓度智能控制系统,阐述了ATmega128单片机与温湿度传感器、氡室制冷系统和除湿系统等部件接口,实现氡室内浓度稳定的软、硬件技术要点.此外,控制系统既可以独立完成对氡室浓度的监控,也可以通过RS-232C接口与PC机通信,组成基于PC机的氡室浓度控制系统.

关 键 词:氡室  浓度控制  AVR单片机  串行通信
文章编号:0258-0934(2007)04-0713-03
修稿时间:2006-08-10

Implementation of intelligent concentration control system of radon chamber
ZHOU Wei,FANG Fang,ZHENG Yong-ming,YAN Ping,LIU Yi.Implementation of intelligent concentration control system of radon chamber[J].Nuclear Electronics & Detection Technology,2007,27(4):713-715.
Authors:ZHOU Wei  FANG Fang  ZHENG Yong-ming  YAN Ping  LIU Yi
Affiliation:ChengDu University of Technology, Nuclear College, Chengdu 610059, China
Abstract:Intelligent concentration system of radon chamber based on AVR MCU is presented. The applied technical points of concentration stabilization in radon chamber are introduced in detail, such as the software and hardware of ATmega128 MC.U interfacing with temperature and humidity sensor, with refrigeration system, and with dehumidifying system. Furthermore, the control system can both monitor the concentration in radon chamber independently, and form an intelligent control system based on PC by communicating with MCU through RS-232C interface.
Keywords:radon chamber  concentration control  AVR MCU  RS-232C
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