| 奥氏体不锈钢上功能梯度SiC薄膜的制备和性能 |
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| 引用本文： | 李合琴,都智,储汉奇,聂竹华.奥氏体不锈钢上功能梯度SiC薄膜的制备和性能[J].材料热处理学报,2012,33(1):150-154. |
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| 作者姓名： | 李合琴 都智 储汉奇 聂竹华 |
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| 作者单位： | 合肥工业大学材料科学与工程学院,安徽合肥,230009 |
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| 基金项目： | 国家“973”计划项目，安徽省自然科学基金，安徽省高校自然科学基金 |
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| 摘 要： | 用磁控溅射法在奥氏体不锈钢基片上制备了SiC单层膜和Ti/TiN双层膜以及Ti/TiN/SiC功能梯度薄膜。采用XRD和显微硬度计对薄膜的结晶质量和硬度进行表征;用AFM和SEM对薄膜的表面和截面形貌进行了表征。结果表明:Ti/TiN双层膜在氩氮流量比为15∶15时,薄膜的结晶质量最好,硬度最高,达到15.6 GPa,最适合作为钢基SiC薄膜的缓冲层。另外,功能梯度SiC薄膜比SiC单层膜的结晶质量好;不同退火温度下功能梯度SiC薄膜的硬度高于SiC单层膜,同时功能梯度SiC薄膜的表面结晶质量也优于SiC单层膜。
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| 关 键 词： | 奥氏体不锈钢 磁控溅射 SiC单层膜 Ti/TiN双层膜 Ti/TiN/SiC功能梯度薄膜 |
Preparation and properties of Ti/TiN/SiC functionally gradient films on austenitic stainless steel |
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| LI He-qin,DU Zhi,CHU Han-qi,NIE Zhu-hua.Preparation and properties of Ti/TiN/SiC functionally gradient films on austenitic stainless steel[J].Transactions of Materials and Heat Treatment,2012,33(1):150-154. |
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| Authors: | LI He-qin DU Zhi CHU Han-qi NIE Zhu-hua |
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| Affiliation: | (School of Materials Science and Engineering,Hefei University of Technology,Heifei 230009,China) |
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| Abstract: | SiC film,Ti/TiN bilayers and Ti/TiN/SiC functionally gradient films were prepared on austenitic stainless steel by magnetron sputtering method.Crystallinity and microhardness of these films were analyzed by XRD and microhardness test,and the surface and sectional morphology were analyzed by AFM and SEM.The results show that the crystallinity of Ti/TiN bilayer films is the best and the microhardness reaches the maximum value of 15.6 GPa when the ratio of argon to nitrogen is 15∶15,which is used for the buffer layer of Ti/TiN/SiC functionally gradient films.The crystallinity,microhardness and surface quality of the Ti/TiN/SiC functionally gradient films are better than those of SiC monolayer film. |
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| Keywords: | austenitic stainless steel magnetron sputtering SiC monolayer films Ti/TiN bilayer films Ti/TiN/SiC functionallygradient films |
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