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RbN3分解时间对原子气室吸收光谱的影响
引用本文:刘雅丽,李维,李昱东,李小宽,冯梁森,李新良.RbN3分解时间对原子气室吸收光谱的影响[J].计测技术,2023(4).
作者姓名:刘雅丽  李维  李昱东  李小宽  冯梁森  李新良
作者单位:航空工业北京长城计量测试技术研究所 计量与校准技术重点实验室,北京 100095
摘    要:为了解决原子气室制备过程中碱金属原子定量填充难、稳定性差等问题,首先采用微电子机械系统(Micro-Electro-Mechanical System, MEMS)技术,结合碱金属叠氮化物的光分解方法,通过深硅刻蚀、RbN3溶液定量填充、两次阳极键合、紫外光辐照等工艺成功制备出不同RbN3分解时间的原子气室,然后采用自行搭建的吸收光谱测试装置对不同RbN3分解时间的原子气室进行测试,研究不同RbN3分解时间对原子气室内Rb原子吸收峰强度、半高宽和频移的影响。实验结合理论分析发现:RbN3分解时间为3.5 h时,Rb原子吸收峰强度最大,能够满足高质量原子气室制备的要求,为高质量原子气室的制备提供了重要技术借鉴,为推动基于MEMS原子气室的芯片化计量测试传感技术的发展奠定基础。

关 键 词:原子气室  吸收光谱  叠氮化铷  半高宽  频移

Effect of RbN3 decomposition time on absorption spectra of alkali atom vapor cells
LIU Yali,LI Wei,LI Yudong,LI Xiaokuan,FENG Liangsen,LI Xinliang.Effect of RbN3 decomposition time on absorption spectra of alkali atom vapor cells[J].Metrology & Measurement Technology,2023(4).
Authors:LIU Yali  LI Wei  LI Yudong  LI Xiaokuan  FENG Liangsen  LI Xinliang
Affiliation:Science and Technology on Metrology and Calibration Laboratory, Changcheng Institute of Metrology & Measurement,Aviation Industry Corporation of China, Beijing 100095, China
Abstract:In order to solve the problems of difficult quantitative filling and poor stability of alkali atoms during the preparation of atom vapor cells, alkali atom vapor cells with different RbN3 decomposition time were prepared by micro?electro?mechanical system (MEMS) technology combined with photodecomposition of alkali azide, specifically by deep silicon etching, quantitative filling of RbN3 solution, double anode bonding and ultraviolet irradiation. The atom vapor cells with different RbN3 decomposition time were tested with a self?built absorption spectrum testing device. The influences of different RbN3 decomposition time on the Rb vapor absorption peak intensity, half?height width and frequency shift in the atom vapor cells were studied. Though experiments and theoretical analysis, it is found that when the RbN3 decomposition time is 3.5 h, the Rb atom absorption peak intensity is the largest, which can meet the requirements of high quality atom vapor cell preparation. It provides important technical reference for the preparation of high quality atom vapor cells, and lays the foundation for promoting the development of chip based measurement and sensing technology based on MEMS atom vapor cell.
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