电子束诱导沉积钴微米线及其铁磁性

通过电子束诱导沉积的方法制备了钴(Co)微米线,并利用扫描电子显微镜(SEM)、原子力/磁力显微镜(AFM/MFM)以及物性测量系统(PPMS)等手段对Co微米线的沉积尺寸、微结构、铁磁性和电学性质进行了测试和分析。研究结果表明:Co微米线轮廓清晰、均匀性好。在不同的沉积条件下,微米线的实际长度与设定长度基本一致;实际宽度数据呈类梯形分布,半高宽是设定值的2~10倍;实际厚度低于设定厚度的60%。沉积电流对Co微米线的铁磁特性有重要影响。当沉积电流大于0.5 nA时,样品呈现出良好的铁磁特性。另外,电学性能测试结果显示Co微米线呈现绝缘特性。成功制备了室温铁磁绝缘Co微米线,这将有助于深入开展微纳尺度的结构与器件的研究和应用。

Electron Beam Induced Deposition and Ferromagnetic Properties of Co Microwires

Cobalt(Co)microwires were prepared by the electron beam induced deposition method.The deposition size,micro-structure,ferromagnetic and electrical properties of the Co microwires were measured and analyzed by the scanning electron microscope(SEM),atomic force microscope/magnetic force microscope(AFM/MFM)and physical property measurement system(PPMS).The research results indicate that the Co microwires possess clear contour and good uniformity.Under different deposition conditions,the actual length of the microwire is basically the same as the set length.The actual width data appear trapezoidal distribution,the half-height width is 2-10 times of the set value,and the actual thickness is less than 60%of the set thickness.The deposition current has a great effect on the ferromagnetic property of the Co microwires.When the deposition current is larger than 0.5 nA,the samples show good ferromagnetic property.Moreover,the electrical performance test results reveal that the Co microwires are insulator.The insulating Co microwires with the ferromagnetic property were successfully prepared at room temperature,which will be helpful for the further research and application of the structures and devices at micro-nano scale.