A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures |
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| Authors: | Markus M. Zieger Patrick Müller Eva Blasco Charlotte Petit Vincent Hahn Lukas Michalek Hatice Mutlu Martin Wegener Christopher Barner‐Kowollik |
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| Affiliation: | 1. Macromolecular Architectures, Institut für Technische Chemie und Polymerchemie, Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany;2. Institute of Applied Physics and Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany;3. Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Eggenstein‐Leopoldshafen, Germany;4. School of Chemistry, Physics and Mechanical Engineering, Queensland University of Technology (QUT), QLD, Brisbane, Australia |
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| Abstract: | The selective removal of structural elements plays a decisive role in 3D printing applications enabling complex geometries. To date, the fabrication of complex structures on the microscale is severely limited by multistep processes. Herein, a subtractive photoresist platform technology that is transferable from microscopic 3D printing via direct laser writing to macroscopic structures via stereolithography is reported. All resist components are readily accessible and exchangeable, offering fast adaptation of the resist's property profile. The micro‐ and macroprinted structures can be removed in a facile fashion, without affecting objects based on standard photoresists. The cleavage is analyzed by time‐lapse optical microscopy as well as via in‐depth spectroscopic assessment. The mechanical properties of the printed materials are investigated by nanoindentation. Critically, the power of the subtractive resist platform is demonstrated by constructing complex 3D objects with flying features on the microscale. |
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| Keywords: | 3D printing direct laser writing microstructures photochemistry polymeric materials stereolithography |
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