| 柔性ITO衬底上铜酞菁薄膜有序生长的X射线衍射研究 |
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| 引用本文： | 梁氏秋水,陈振兴,朱宏伟,盛勇,胡豫. 柔性ITO衬底上铜酞菁薄膜有序生长的X射线衍射研究[J]. 化工新型材料, 2009, 37(11) |
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| 作者姓名： | 梁氏秋水 陈振兴 朱宏伟 盛勇 胡豫 |
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| 作者单位： | 中山大学化学与化学工程学院,广州,510275;中山大学化学与化学工程学院,广州,510275;中山大学化学与化学工程学院,广州,510275;中山大学化学与化学工程学院,广州,510275;中山大学化学与化学工程学院,广州,510275 |
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| 基金项目： | 国家自然科学基金资助项目，广东省自然科学基金资助项目 |
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| 摘 要： | 采用石英晶体微天平实时监测薄膜生长速率,通过控制衬底温度与薄膜生长速率,在柔性ITO导电衬底上真空蒸发沉积了铜酞菁薄膜.X射线衍射分析表明,适当提高衬底温度与薄膜生长速率,可促进薄膜的有序生长.当衬底温度为90℃,生长速率为10nm/min时,薄膜的有序度最高,薄膜晶型呈(相和(200)晶面.
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| 关 键 词： | 铜酞菁 X射线衍射 柔性衬底 真空蒸发沉积 有序薄膜 |
X-ray diffraction investigations of well-ordered copper phthalocyanine films deposited on flexible ITO substrate |
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| Liangshi Qiushui,Chen Zhenxing,Zhu Hongwei,Sheng Yong,Hu Yu. X-ray diffraction investigations of well-ordered copper phthalocyanine films deposited on flexible ITO substrate[J]. New Chemical Materials, 2009, 37(11) |
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| Authors: | Liangshi Qiushui Chen Zhenxing Zhu Hongwei Sheng Yong Hu Yu |
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| Abstract: | Through controlling substrate temperature and growth rate detected by quartz crystal microbalance meas-urement, CuPc films were deposited on flexible ITO substrate. X-ray diffraction investigation shown that the growth of CuPc films were strongly affected by substrate temperature and growth rate. Well-ordered CuPe film could be deposited at substrate temperature 90℃ and growth rate 10nm/min. Crystal structure of the as-prepared CuPc film was existed as (phase and (200) plane. |
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| Keywords: | copper phthalocyanine X-ray diffraction flexible substrate vacuum evaporation deposition well-or-dered film |
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