| 精细TiN陶瓷薄膜的抗拉强度和界面结合强度 |
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| 引用本文： | 刘长清,李美栓,金柱京,吴维.精细TiN陶瓷薄膜的抗拉强度和界面结合强度[J].金属学报,1992,28(9):91-94. |
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| 作者姓名： | 刘长清 李美栓 金柱京 吴维 |
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| 作者单位： | 中国科学院金属腐蚀与防护研究所腐蚀科学开放研究实验室，中国科学院金属腐蚀与防护研究所腐蚀科学开放研究实验室，中国科学院金属腐蚀与防护研究所腐蚀科学开放研究实验室，中国科学院金属腐蚀与防护研究所腐蚀科学开放研究实验室 助理研究员，沈阳(110015) |
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| 摘 要： | 采用声发射监测悬臂梁弯曲实验法测量并计算出HCD离子镀法制备的精细TiN陶瓷薄膜的抗拉强度,及其与钛基材界面抗剪切强度(结合强度)值分别是:603MPa,242MPa。
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| 关 键 词： | TiN薄膜 抗拉强度 结合强度 |
| 收稿时间： | 1992-09-18 |
| 修稿时间： | 1992-09-18 |
TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE |
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| LIU Changqing,LI Meishuan,JIN Zhujing,WU Weitao.TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE[J].Acta Metallurgica Sinica,1992,28(9):91-94. |
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| Authors: | LIU Changqing LI Meishuan JIN Zhujing WU Weitao |
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| Affiliation: | LIU Changqing,LI Meishuan,JIN Zhujing,WU Weitao (Corrosion Science Lab.,Institute of Corrosion and Protection of Metals,Academia Sinica. Shenyang ) |
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| Abstract: | The cantilever bending test, particularly monitored by an acoustic emission technique, was adopted to measure the tensile and interfacial adhesive strengths of the HCD ion-plated fine TiN film on pure Ti substrate. The behaviours of film damaging were found due to: for TiN facing upward, an exceeded internal tensile stress over its tensile strength, and for TiN facing downward, an exceeded shearing stress along film/substrate interface over its adhesive strength. The measured tensile and adhesive strengths are 603 and 242 MPa respectively. |
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| Keywords: | tensile strength adhesive strength TiN film |
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