Time-modulated CVD process optimized using the taguchi method |
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| Authors: | W Ahmed E Ahmed C Maryan M J Jackson A A Ogwu N Ali V F Neto J Gracio |
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| Affiliation: | (1) Dalton Research Institute, Manchester Metropolitan University, Chester Street, M1 5GD Manchester, U.K.;(2) Birck Nanotechnology Center, Purdue University, 47907 West Lafayette, IN;(3) Thin Films Centre, University of Paisley, Paisley, Scotland, U.K.;(4) Department of Mechanical Engineering, University of Aveiro, 3810-193 Aveiro, Portugal |
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| Abstract: | The Taguchi method is used herein to optimize the time-modulated chemical vapor deposition (TMCVD) process. TMCVD can be used
to deposit smooth, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi
method to optimize the TMCVD process can save time, effort, and money. The Taguchi method significantly reduces the number
of experiments required to optimize a fabrication process. In this study, the effect of five TMCVD process parameters is investigated
with respect to five key factors of the as-grown samples. Each parameter was varied at four different values (experimental
levels). The five key factors, taking into consideration the experimental levels, were optimized after performing only 16
experiments. The as-grown films were characterized for hardness, quality, surface roughness, and microstructure using scanning
electron microscopy, Raman spectroscopy, surface profilometry, and Vickers hardness testing.
This paper was presented at the fourth International Surface Engineering Congress and Exposition held August 1–3, 2005 in
St. Paul, MN. |
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| Keywords: | chemical vapor deposition (CVD) diamond experimental design process optimization Taguchi |
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