Microstructure Development in RuO2-Glass Thick-Film Resistors and Its Effect on the Electrical Resistivity |
| |
| Authors: | Takashi Yamaguchi Kazuhiko Iizuka |
| |
| Affiliation: | Faculty of Science and Technology, Keio University, Yakohama, Japan |
| |
| Abstract: | Microstructure development in RuO2-glass thick-film resistors has been studied by optical microscopy with special emphasis on the effect of glass particle size and mixing and firing conditions. The microstructure development has been characterized by the coalescence of glass grains, infiltration of glass into RuO2 particle aggregates, and agglomeration of RuO2 particles. The resistivity-firing temperature relationship has been correlated with the microstructure development. |
| |
| Keywords: | ruthenium glass electrical resistivity microstructure films |
|
