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薄膜中晶粒正常生长过程的研究
引用本文:韩钧,赵秀超. 薄膜中晶粒正常生长过程的研究[J]. 电子与封装, 2006, 6(9): 38-40
作者姓名:韩钧  赵秀超
作者单位:南京电子器件研究所,南京,210016;南京电子器件研究所,南京,210016
摘    要:通过建立一个理论模型研究了薄膜中正常晶粒生长过程中晶粒的变化情况。晶粒按照边长数被分成不同的组,可以通过晶粒消失与晶界转换两种方式来改变边长的数目,在不同组之间进行转换。晶粒的长大与缩小由边长数与晶粒大小决定。计算机模拟的结果表明平均晶粒尺寸随时间呈线性增长,晶粒尺寸分布与已报道的结果基本一致。

关 键 词:薄膜  晶粒生长  平均晶粒尺寸
文章编号:1681-1070(2006)09-0038-03
收稿时间:2006-06-05
修稿时间:2006-06-05

Research of the Normal Grain Growth in Thin Films
HAN Jun,ZHAO Xiu-chao. Research of the Normal Grain Growth in Thin Films[J]. Electronics & Packaging, 2006, 6(9): 38-40
Authors:HAN Jun  ZHAO Xiu-chao
Affiliation:Nanjing Electronic Device Institute, Nanjing 210016, China
Abstract:This paper presents a model which describes normal grain growth in thin films.The grains are divided into different groups according to the number of their boundaries.The change of the grain boundary's number can be completed through two ways:the disappearance of a small triangle and the transfer from a rectangle to a triangle.The growth or shrinkage of the grains depend on the number of boundaries and their size. Shnulated results show that the average size of grains increases linearly with time.The grain size distribution in this model is consistent with other works.
Keywords:thin films   grain growth   the average size of grains
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