| 硅片和硅器件工艺中的本征吸除技术 |
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| 引用本文： | 胡才雄. 硅片和硅器件工艺中的本征吸除技术[J]. 有色金属材料与工程, 1992, 0(3) |
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| 作者姓名： | 胡才雄 |
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| 作者单位： | 上海有色金属研究所 上海，201600 |
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| 摘 要： | 本文介绍了本征吸除技术的产生、发展、应用,以及本征吸除的机制。
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| 关 键 词： | 硅 本征吸除 氧沉淀 集成电路 |
Intrinsic Gettering Technology Used in the Process of Silicon Wafer and Silicon Device |
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| Hu Caixiong. Intrinsic Gettering Technology Used in the Process of Silicon Wafer and Silicon Device[J]. Nonferrous Metal Materials and Engineering, 1992, 0(3) |
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| Authors: | Hu Caixiong |
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| Affiliation: | Shanghai Nonferrous Metals Research Institute |
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| Abstract: | The genesis,development,application and the mechanism of theintrinsic gettering technology are introduced in this paper. |
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| Keywords: | Silicon Intrinsic gettering Oxygen precipitation Integrated circuit |
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