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紫外辅助增强ABS与镀层间粘结性的研究
引用本文:赵文霞,陈怀军,王增林.紫外辅助增强ABS与镀层间粘结性的研究[J].电镀与精饰,2017,39(10).
作者姓名:赵文霞  陈怀军  王增林
作者单位:1. 宁夏师范学院化学化工学院,宁夏固原,756000;2. 陕西师范大学化学化工学院应用表面与胶体化学教育部重点实验室,陕西西安,710119
基金项目:国家自然科学基金,宁夏科技创新领军人才项目,宁夏高等学校优秀青年教师培育基金项目,宁夏高等学校一般科学研究项目,宁夏师范学院六盘山资源工程技术研究中心
摘    要:在紫外光照射下利用环境友好的H_2SO_4-MnO_2-H_3PO_4-H_2O四元微蚀体系对丙烯腈-丁二烯-苯乙烯共聚物(ABS)进行微蚀处理,研究了紫外光功率及紫外光照射时间对ABS表面形貌、表面亲水性及粘结强度的影响。结果表明,在H_2SO_4-MnO_2-H_3PO_4-H_2O四元微蚀体系中,当微蚀时间为10 min,紫外光照射功率分别为300 W和500 W,照射时间分别为8 min和6 min时,ABS基板中的聚丁二烯相与聚丙烯腈-苯乙烯相之间存在较大的微蚀速率差,ABS基板表面的微孔数量多、致密且均匀,ABS基板的表面由憎水性变为强的亲水性,粘结强度分别为1.08 kN/m和1.10 kN/m,相较于四元微蚀体系在55℃无紫外光辅助照射下微蚀处理10 min后所得的0.64 kN/m,粘结强度显著提高。

关 键 词:紫外光照射  ABS  表面微蚀  粘结强度

Research on Adhesion Enhancement of ABS Copolymer to Electroless Plating Copper with Ultraviolet-Assisted Treatment
ZHAO Wenxia,CHEN Huaijun,WANG Zenglin.Research on Adhesion Enhancement of ABS Copolymer to Electroless Plating Copper with Ultraviolet-Assisted Treatment[J].Plating & Finishing,2017,39(10).
Authors:ZHAO Wenxia  CHEN Huaijun  WANG Zenglin
Abstract:An environment-friendly quaternary etching system,H2SO4-MnO2-H3PO4-H2O colloid,was used as the etching solution to investigate surface etching performance of the acrylonitrile-butadiene-styrene (ABS) plastic under the ultraviolet (UV) light.The effects of the UV power and the UV irradiation time on the ABS surface topography,the adhesion strength,and the surface contact angle were studied.The results indicated that many cavities appeared on the surface of the ABS substrates when the UV-light assisted conditions were 300 W for 8 min and 500 W for 6 min,respectively,and the etching treatment time was fixed at 10 min.At this point,the difference of etching rate between the acrylonitrile-styrene phase and the butadiene phase reached to the maximum,and large numbers of microvoids appeared on the ABS substrates with uniform and compact surface,and the ABS substrate surface changed into strong hydrophilic from hydrophobic.The adhesion strength increased from 0.64 kN/m,which was obtained under the condition of etched only by the H2SO4-MnO2-H3PO4-H2O quaternary system at 55 ℃,to 1.08 kN/m and 1.10 kN/m,respectively.
Keywords:UV light  ABS  surface etching treatment  adhesion strength
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