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Facility Layout Planning Using Self-Organization Method
Authors:K UedaN Fujii  I HatonoM Kobayashi
Affiliation:a Department of Mechanical Engineering, Kobe University, Japan
b Information Processing Center, Kobe University, Japan
c Core Technology & Network Company, Sony Corporation, Japan
Abstract:This paper proposes a novel approach to facility layout planning based on the concept of biological manufacturing systems that deal with the inherent complexity of manufacturing using ideas of self-organization, evolution and learning. A self-organization method is proposed to generate facility layout plans autonomously according to the material flow which emerges from the local interactions among production elements. A case study of facility layout planning is presented for semiconductor manufacturing, in which it is difficult to find a proper layout because of complex process flow. The effectiveness of the proposed method is discussed in terms of the accumulated traveling distance of products and the throughput.
Keywords:Manufacturing Systems  Layout Planning  Adaptive Systems
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