Surface patterning for brittle amorphous material using nanoindenter-based mechanochemical nanofabrication

This paper demonstrates a micro/nanoscale surface patterning technology for brittle material using mechanical and chemical processes. Fused silica was scratched with a Berkovich tip under various normal loads from several mN to several tens of mN with various tip rotations. The scratched substrate was then chemically etched in hydrofluoric solution to evaluate the chemical properties of the different deformed layers produced under various mechanical scratching conditions. Our results showed that either protruding or depressed patterns could be generated on the scratched surface after chemical etching by controlling the tip rotation, the normal load and the etching condition. In addition, the mask effect of amorphous material after mechanical scratching was controlled by conventional mechanical machining conditions such as contact area, chip formation, plastic flow and material removal.