A novel high performance SemiSJ-CSTBT with p-pillar under the bottom of the trench gate |
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Authors: | Jia Yan Chen Hong Tan Ji Lu Shuojin Zhu Yangjun |
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Affiliation: | 1. Jiangsu R&D Center for Internet of Things, Wuxi 214135, China;2. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;3. Junshine CAS-IGBT Technology Co., Ltd, Wuxi 214135, China |
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Abstract: | A novel high performance SemiSJ-CSTBT is proposed with the p-pillar under the bottom of the trench gate. The inserted p-pillar with the neighbouring n-drift region forms a lateral P/N junction, which can adjust the electric distribution in the forward-blocking mode to achieve a higher breakdown voltage compared to the conventional CSTBT. Also, the p-pillar can act as a hole collector at turn-off, which significantly enhances the turn-off speed and obtains a lower turn-off switching loss. Although the turn-off switching loss decreases as the depth of the p-pillar increases, there is no need for a very deep p-pillar. The associated voltage overshoot at turn-off increases dramatically with increasing the depth of p-pillar, which may cause destruction of the devices. Plus, this will add difficulty and cost to the manufacturing process of this new structure. Therefore, the proposed SemiSJ-CSTBT offers considerably better robustness compared to the conventional CSTBT and SJ-CSTBT. The simulation results show that the SemiSJ-CSTBT exhibits an increase in breakdown voltage by 160 V (13%) and a reduction of turn-off switching loss by approximately 15%. |
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Keywords: | CSTBT high breakdown voltage p-pillar SemiSJ-CSTBT turn-off switching loss |
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