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Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition
Authors:Kerstin Taeschner  Hagen BartzschPeter Frach  Eberhard Schultheiss
Affiliation:
  • Fraunhofer Institute for Electron Beam and Plasma Technology (FEP), Winterbergstr. 28, 01277 Dresden, Germany
  • Abstract:The magnetron-plasma-enhanced chemical vapor deposition (magPECVD) provides silicon-organic thin films for optical, electrically insulating or diffusion barrier coating applications. With process pressures of ≤ 1 Pa this technology is well adapted to the sputtering process of optical interference coatings and also facilitates an inline-process implementation. This paper describes the deposition process for scratch resistant coatings on polycarbonate (PC) and allyl diglycol carbonate substrates. Based on the optical, chemical and mechanical characterization of single magPECVD thin films of varied chemical composition, several types of layer stacks (e.g. of gradient or alternating hardness distribution) were deposited with varied total thickness on PC substrates. Abrasion test results indicate two main effects: the resistance against scratches of high load abrasion (50 N) mainly depends on the total coating thickness. The durability against scratches of low load abrasion (5 N) shows a clear advantage for the multilayer design in contrast to homogeneous single layers even of higher thickness. Finally a 5-layer antireflective system was reactively sputtered onto the magPECVD coating and successfully passed adhesion and environmental tests.
    Keywords:Magnetron-PECVD   Reactive sputtering   Optical coating   Hard coating
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