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Superconducting characteristics and epitaxial-growth analyses of YBa2Cu3O7−x thin films by direct-current magnetron sputtering
Authors:Yijie Li  Guangcheng Xiong  Zizhao Gan  Congxin Ren  Guoliang Chen  Shichang Zou
Affiliation:(1) Department of Physics, Peking University, 100871 Beijing, People's Republic of China;(2) Ion Beam Laboratory, Shanghai Institute of Metallurgy, 200050 Shanghai, People's Republic of China
Abstract:Using direct-current magnetron sputtering deposition, we have successfully prepared highquality epitaxial YBa2Cu3O7–x thin films, on (1 0 0) and (1 1 0) ZrO2, SrTiO3 and LaAlO3 substrates. The films reached zero resistance at about 90 K and had a critical current density, J c (at 77 K, H=O), above 106 Acm–2. Electrical measurements showed that the films had a small microwave surface resistance. The epitaxial structure of the films was studied by X-ray diffraction (XRD), Rutherford backscattering (RBS) and channeling spectroscopy, X-ray double-crystalline diffraction and transmission electron microscopy (TEM). It was found that the c-axis of the film grown on the (1 0 0) substrates under optimum deposition conditions was perpendicular to the substrate surface. But on the (1 1 0) substrates, epitaxial growth was along the (1 1 0) or (1 0 3) direction. The experimental results indicate that the films had excellent superconducting properties and complete epitaxial structure.
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