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不同电源等电位离子钨钼共渗的研究
引用本文:申罡,高原,王成磊,卜根涛.不同电源等电位离子钨钼共渗的研究[J].材料导报,2010,24(6).
作者姓名:申罡  高原  王成磊  卜根涛
作者单位:桂林电子科技大学信息材料科学与工程系,桂林,541004;桂林电子科技大学信息材料科学与工程系,桂林,541004;桂林电子科技大学信息材料科学与工程系,桂林,541004;桂林电子科技大学信息材料科学与工程系,桂林,541004
基金项目:信息材料广西重点实验室主任研究课题,国家自然科学基金,广西研究生科研创新项目 
摘    要:利用脉冲单电源和直流单电源,分别在Q235钢表面进行等离子钨钼共渗.通过对不同电源钨钼共渗试样的渗层组织、渗层成分分布、晶体结构、渗层硬度分布的检测和比较,分析了2种电源对等离子钨钼共渗的影响.结果表明,利用单一电源均可在Q235钢表面形成明显反应扩散层;在相同工艺下,采用脉冲电源所得到的试样渗层厚度较采用直流电源的渗层厚度增加了18.1%;脉冲电源试样表面W、Mo含量(质量分数,下同)分别约为8.4%和9.8%,直流电源试样表面W、Mo含量分别为8.2%和8.9%,可见2种电源渗层表面含W、Mo量相差不大;2种电源渗层相结构均为Fe_7W_6和Fe_3Mo金属间化合物相;钨钼共渗后渗层硬度提高不明显.

关 键 词:脉冲  直流  双辉  表面改性  钨钼共渗

Effects of Different Power Sources with Equal Potential on Plasma W-Mo Surface Alloying Process
Abstract:Q235 steel is subjected to single plasma W-Mo alloying process using the pulse power supply and the DC power supply respectively. Then the metallurgical structure, crystal structure and hardness distribution of alloying layers are tested. The effects of two different power sources on plasma W-Mo alloying process are analyzed. The results show that single glow discharge technique can realize surface alloying on metal material. The reaction diffusion layers form on the surface of Q235 steel Under the same conditions, compared with DC power supply the alloying layer of pulse power supply increased by 18.1% in thickness. When using pulse power source, the surface contents of W and Mo are 8. 4% and 9. 8% respectively. While using direct current supply the surface contents of W and Mo are 8. 2% and 8.9% respectively. It can be seen that contents of W and Mo using two power supply are almost the same. The phases of the two alloying layers are composed of Fe_7 W_6 and Fe_3 Mo intermetallics. W-Mo co-diffusing process makes little contribute to the micro-hardness increase of the alloying layer.
Keywords:pulse  DC  double glow  surface modification  W-Mo surface alloying
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