电沉积铜／镍纳米多层膜及巨磁阻效应

以（110）高择优的Cu片为基体，在硫酸盐溶液中采用常规脉冲法制备了不同调制波长的Cu／Ni纳米多层膜。利用扫描电镜（SEM）分别对多层膜的断面及表面进行表征。结果表明，Cu／Ni纳米多层膜子层厚度均匀连续，且表面与调制波长有紧密联系。利用传统的四探针法对多层膜巨磁阻（GMR）进行测试。结果表明，在一定调制波长范围内GMR值随调制波长增大而减小。分别对铜和镍子层厚度及周期数进行优化，制备出GMR值高达34．4％的Cu／Ni多层膜。

Cu/Ni Nanometer Multilayer Film Prepared by Electrochemical Deposition and its Giant Magneto Resistance

Cu/Ni nanometer multilayer film with different modulated wavelength are prepared on highly （110）- oriented copper substrate by general pulse method in sulfate plating solution . The cross section and surface morphology of the nano meter multilayer are examined by SEM. The results show that the sub-layers in thickness of Cu/Ni nanometer multilayer have continuous and clear structure. The surface morphology of Cu/Ni nanometer multilayer is mainly affected by the modu lated wavelength. The giant magneto resistance （GMR） properties of multilayer are investigated by traditional four-probe technique. The results indicate that GMR value is decreased with the increase of modulated wave length. Under the optimum conditions of sub-layers in thickness of copper and nickel and number of periods, GMR value of Cu/Ni Nanometer multilayer is up to 34.4 %.