Phosphorus-doped, silver-based pastes for self-doping ohmic contacts for crystalline silicon solar cells

Undoped and phosphorus-doped Ag-based pastes were applied as circular contacts to the (1 1 1) surface of dendritic web n-type Si. Current–voltage characteristics of as-deposited contacts and contacts annealed at 780°C for 10 min, 950°C for 5 min, 1000°C for 10 min were measured and compared. Annealing above the Ag–Si eutectic temperature (835°C) yielded Si precipitation within the Ag matrix, resulting in increased current across the metal/semiconductor interface. The contact resistivity was significantly lower for P-doped (<0.04 Ω cm²) than for undoped (1.90 Ω cm²) Ag contacts, both of which were annealed at 1000°C. As supported by secondary ion mass spectrometry analyses, these results are attributed to an enhanced P doping level in the Si substrate after annealing the P-doped contacts. A p–n junction diode was demonstrated by alloying the Ag–P paste with p-type Si at 1000°C. The contact resistance was inferred from diode I–V data to be 0.013 Ω cm², a value which is comparable to the 0.010 Ω cm² target value for solar cell contacts.