Fabrication of low-cost mold and nanoimprint lithography using polystyrene nanosphere |
| |
Authors: | G.H. Jeong K.K. Lee C.H. Lee C.W. Yang |
| |
Affiliation: | a School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea b Advanced Materials and Process Research Center for IT, Sungkyunkwan University, Suwon 440-746, Republic of Korea |
| |
Abstract: | The periodic arrays of nanostructure were successfully patterned on Si wafers by ultraviolet nanoimprint lithography (UV-NIL) using nanosphere lithography (NSL). Two-dimensional (2D) well ordered self-assembled arrays were obtained on Si wafer by using nanosphere and the tilted-drain method. We tried to combine two techniques and hard mold of Si mold for NIL and polymer mold of acrylate-based polymer were fabricated by NSL. The Si master mold and polymer mold were formed by Cr lift-off and ICP-RIE process. The surface has a low surface energy at the interface with 1H, 1H, 2H, 2H-perfluorooctyl-trichlorosilane (FOTS) vapor-coating, which can eliminate the problem of the adherence to the surface of the mold during demolding. Finally, nanopatterns were formed by UV-NIL, where the residual layer was not observed. |
| |
Keywords: | Nanoimprint lithography Nanosphere Polymer mold Nanopatterning |
本文献已被 ScienceDirect 等数据库收录! |
|