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电沉积法制备226Ra α样品源的优化研究
引用本文:徐平,於国兵,梁永广,顾先宝,闻德运,龚籽月,陈志. 电沉积法制备226Ra α样品源的优化研究[J]. 原子能科学技术, 2021, 55(2): 343-347. DOI: 10.7538/yzk.2020.youxian.0175
作者姓名:徐平  於国兵  梁永广  顾先宝  闻德运  龚籽月  陈志
作者单位:中国科学技术大学,安徽 合肥230027;安徽省辐射环境监督站,安徽 合肥230071
摘    要:α能谱法是一种直接测量α衰变的方法,具有探测限低、分析时间相对较短等优点。电沉积法制备的α样品源均匀且厚度可忽略,是目前最理想的制备226Ra的α样品源的方法。为制得较高电沉积率的226Ra的α样品源,本文对草酸氨/盐酸电沉积液中氯铂酸用量、电流密度、电沉积时间、草酸氨溶液的初始pH值和浓度等条件对226Ra电沉积率的影响进行了优化研究。结果表明,在氯铂酸用量为700 μg、电流密度为0.225 A/cm2、电沉积时间为60 min、草酸氨溶液浓度为0.05~0.13 mol/L、草酸氨溶液的初始pH值为1.0~2.5等电沉积条件下,226Ra电沉积样品源的电沉积率大于95%。

关 键 词:电沉积法, 226Ra')"  >226Ra, α样品源, 氯铂酸

Optimization for Preparation of Plating226Ra for α Spectrometry
XU Ping,YU Guobing,LIANG Yongguang,GU Xianbao,WEN Deyun,GONG Ziyue,CHEN Zhi. Optimization for Preparation of Plating226Ra for α Spectrometry[J]. Atomic Energy Science and Technology, 2021, 55(2): 343-347. DOI: 10.7538/yzk.2020.youxian.0175
Authors:XU Ping  YU Guobing  LIANG Yongguang  GU Xianbao  WEN Deyun  GONG Ziyue  CHEN Zhi
Affiliation:University of Science and Technology of China, Hefei 230027, China;Anhui Radiation Environmental Supervision Station, Hefei 230071, China
Abstract:α spectrometry is a direct method to measure α-emitting radionuclides, which has the advantages of low detection limit and short time-consuming. The electrodeposition method is the most ideal technique for preparation of source for α spectrometry, by which the source is homogeneous and self-absorbance negligible. To obtain high quality of electrodeposition sample of226Ra, the effects of the quality of chloroplatinic acid, current density, electrodeposition time, initial pH and concentration of ammonia oxalate on electrodeposition yield of226Ra were investigated on the base of the ammonia oxalate/hydrochloric acid electrolytes. The results show that under the conditions of chloroplatinic acid doseage of 700 μg, the current density of 0.225 A/cm2, the electrodeposition time of 60 min, the concentration of ammonia oxalate of 0.05-0.13 mol/L, the initial pH of ammonia oxalate of 1.0-2.5, the electrodeposition yield of226Ra is over 95%.
Keywords:electrodeposition method  226Ra  &alpha  source  chloroplatinic acid  
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