首页 | 本学科首页   官方微博 | 高级检索  
     

气藏早期水侵识别方法
引用本文:康晓东,李相方,张国松.气藏早期水侵识别方法[J].天然气地球科学,2004,15(6):637-639.
作者姓名:康晓东  李相方  张国松
作者单位:1.石油大学石油天然气工程学院,北京 102249;2.吐哈油田勘探开发研究院,新疆 哈密 839009
摘    要:地层出水会直接导致气井产能的损失与气藏采收率的降低,也会给气藏的开发带来严重的不利影响。在水驱气藏的开发中,水侵的早期识别是充分利用无水期进行生产与主动地实施治水措施的前提。目前水侵的识别方法主要有产出水分析、压降曲线识别、试井监测和模拟计算等。在阐述了这些方法的原理、适应性与存在的问题的基础上指出,应基于气井地质信息,采用多种方法进行水侵识别。

关 键 词:气藏    水气比    水侵量    不稳定试井  
文章编号:1672-1926(2004)06-0637-03
收稿时间:2004-06-07

METHODS TO IDENTIFY EARLY WATER INFLUX OF GAS RESERVOIRS
KANG Xiao-dong,LI Xiang-fang,ZHANG Guo-song.METHODS TO IDENTIFY EARLY WATER INFLUX OF GAS RESERVOIRS[J].Natural Gas Geoscience,2004,15(6):637-639.
Authors:KANG Xiao-dong  LI Xiang-fang  ZHANG Guo-song
Affiliation:1.Faculty of Petroleum Engineering, University of Petroleum, Beijing 102249, China;2.Exploration and Development Institute, Tuha Oilfield, Hami 839009, China
Abstract:Watering out of gas wells influences the deliverability of gas wells and the recovery of gas reservoirs severely. During the development of gas reservoirs, it is key to identify early water influx for producing without water and developing actively. Presently, there are many methods such as water monitoring, pressure monitoring, well test and so on. In this paper, the applicability of the methods is presented respectively: the method of water monitoring can be used only after producing water of gas well, the method of P/Z plot is used at the stage of nonlinear relationship between P/Z and cumulative gas production, the methods of well test can be used with abundance well test data, water influx calculation has its uncertainty. And then, it is given that analyzing all information on water invasion synthetically is the only way to reducing the risk of identifying early water influx of gas reservoirs based on its complexity and the applicability of the methods.
Keywords:Gas reservoirs  Water gas rate  Water influx  Transient well testing  
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《天然气地球科学》浏览原始摘要信息
点击此处可从《天然气地球科学》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号