| 无支撑、光学级MPCVD金刚石膜的研制 |
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| 引用本文： | 丁明清,陈长青,白国栋,李含雁,冯进军,胡银富. 无支撑、光学级MPCVD金刚石膜的研制[J]. 真空科学与技术学报, 2011, 31(6): 661-665. DOI: 10.3969/j.issn.1672-7126.2011.06.02 |
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| 作者姓名： | 丁明清 陈长青 白国栋 李含雁 冯进军 胡银富 |
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| 作者单位： | 大功率微波电真空器件技术国防科技重点实验室北京真空电子技术研究所 北京100015 |
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| 基金项目： | 国防科技重点实验室基金 |
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| 摘 要： | 利用引进的6 kW微波等离子体化学气相沉积设备,进行了无支撑金刚石膜工艺的初步研究。在800~1050℃的基片温度范围内,金刚石膜都呈(111)择优取向;基片相对位置对沉积较大面积、光学级金刚石膜至关重要。制出0.25 mm厚Φ50 mm的无支撑金刚石膜。拉曼光谱和X射线衍射分析表明,合成的金刚石膜晶体结构完整,sp2含量极低;透过率测试结果说明了优良的光学性能:截止波长225 nm,光学透过率(λ≥2.5μm)≥70%。
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| 关 键 词： | 微波等离子体 化学气相沉积 无支撑金刚石膜 光学透过率 |
Growth of Free-Standing Diamond Films by Microwave Plasma Chemical Vapor Deposition |
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| Ding Mingqing,Chen Changqing,Bai Guodong,Li Hanyan,Feng Jinjun,Hu Yinfu. Growth of Free-Standing Diamond Films by Microwave Plasma Chemical Vapor Deposition[J]. JOurnal of Vacuum Science and Technology, 2011, 31(6): 661-665. DOI: 10.3969/j.issn.1672-7126.2011.06.02 |
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| Authors: | Ding Mingqing Chen Changqing Bai Guodong Li Hanyan Feng Jinjun Hu Yinfu |
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| Affiliation: | Ding Mingqing,Chen Changqing,Bai Guodong,Li Hanyan,Feng Jinjun,Hu Yinfu(Vacuum Electronics National Laboratory,Beijing Vacuum Electronics Research Institute,Beijing 100015,China) |
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| Abstract: | The high quality free-standing diamond films were grown by 6kw microwave plasma chemical deposition(MPCVD) on n-type Si(100) wafer substrates.The impacts of the growth conditions,including the substrate temperature and position,pressure,ratio of CH4/H2 flow rates,and microwave power,on microstructures and properties of the diamond films were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM),Raman spectroscopy,and conventional probes.The results show that the temperature and positio... |
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| Keywords: | Microwave plasma Chemical vapor deposition Free standing diamond films Optical transmission |
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