| 覆Os膜扩散阴极Os-W互扩散的探讨 |
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| 引用本文： | 聂秋玲,程诚. 覆Os膜扩散阴极Os-W互扩散的探讨[J]. 真空电子技术, 2011, 0(4): 72-74,84 |
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| 作者姓名： | 聂秋玲 程诚 |
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| 作者单位： | 北京真空电子技术研究所,北京,100015 |
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| 基金项目： | SEM分析工作是在大功率微波电真空器件技术国防科技重点实验室李含雁工程师的帮助下完成. |
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| 摘 要： | 介绍了对覆锇扩散阴极锇膜与钨基间互扩散过程的研究结果。通过SEM对不同工作时间的阴极发射表面及纵向剖面的形貌进行分析,采用EDS对实验阴极的表面及纵向剖面进行元素成分的分析。研究表明,随工作时间的不同,阴极表面及纵向剖面Os-W浓度发生变化,呈现明显的扩散趋势。
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| 关 键 词： | 阴极 Os膜 互扩散 |
Inter Diffusion Phenomena of Os-W in the Impregnated Cathode |
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| NIE Qiu-ling,CHENG Cheng. Inter Diffusion Phenomena of Os-W in the Impregnated Cathode[J]. Vacuum Electronics, 2011, 0(4): 72-74,84 |
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| Authors: | NIE Qiu-ling CHENG Cheng |
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| Affiliation: | NIE Qiu-ling,CHENG Cheng (Beijing Vacuum Electronics Institute,Beijing 100015,China) |
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| Abstract: | The inter diffusion between Os film and W matrix is studied in this paper.The emission surface and longitudinal section are analyzed by scanning electron microscope and element analysis of cathode sample surface is investigated by energy dispersion X-ray spectroscopy.The investigation reveals that the concentration of Os-W in the emission surface and longitudinal section has changed and inter diffused obviously. |
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| Keywords: | Cathode Os film Diffusion |
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