| 利用脉冲直流磁控溅射制备ZnO:Al薄膜的研究 |
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| 引用本文： | 安会静,雷青松,薛俊明,杨瑞霞,山秀文,李广.利用脉冲直流磁控溅射制备ZnO:Al薄膜的研究[J].真空,2011,48(5). |
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| 作者姓名： | 安会静 雷青松 薛俊明 杨瑞霞 山秀文 李广 |
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| 作者单位： | 1. 河北工业大学信息工程学院,天津,300401
2. 河北汉盛光电科技有限公司,河北衡水,053000 |
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| 基金项目： | 国家科技部科技创新基金(10C26211303683) |
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| 摘 要： | 利用中频脉冲直流磁控溅射法制备了平面ZnO:Al(AZO)透明导电薄膜,研究了沉积压力、衬底温度和溅射功率对AZO薄膜光电性能、薄膜稳定性的影响.结果表明:在较低沉积压力、衬底温度及溅射功率下,可获得具有低电阻率、高透过率、高稳定性的AZO薄膜.
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| 关 键 词： | ZnO:Al 磁控溅射 脉冲直流 AZO |
Deposition of ZnO:Al films by pulsed DC magnetron sputtering |
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| AN Hui-jing,LEI Qing-song,XUE Jun-ming,YANG Rui-xia,SHAN Xiu-wen,LI Guang.Deposition of ZnO:Al films by pulsed DC magnetron sputtering[J].Vacuum,2011,48(5). |
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| Authors: | AN Hui-jing LEI Qing-song XUE Jun-ming YANG Rui-xia SHAN Xiu-wen LI Guang |
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| Affiliation: | AN Hui-jing1,LEI Qing-song2,XUE Jun-ming2,YANG Rui-xia1,SHAN Xiu-wen1,LI Guang1(1.The College of Information Engineering,Hebei university of technology,Tianjin 300401,China,2.China Hisun PV Technology Co.,Ltd,Hengshui 053000,China) |
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| Abstract: | ZnO:Al(AZO) transparent conductive films were deposited on glass substrates by mid-frequency pulsed DC magnetron sputtering.Dependence of the film optical-electrical properties and heat stability on the deposition pressure,substrate temperature and sputtering power were investigated.The results show that AZO films with low resistivity,high transmittance and high heat stability can be obtained under low deposition pressure,substrate temperature and sputtering power. |
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| Keywords: | ZnO:Al magnetron sputtering pulsed DC AZO |
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