采用导磁片改造磁控装置提高靶材利用率

通过对真空溅镀生产线靶材的刻蚀情况观测,发现所有产线均存在不同程度的靶面刻蚀不均现象,而3号线尤为突出,其端部刻蚀深度相对于其它部位刻蚀深度较深,导致靶材使用寿命短,利用率低.采用高磁导率材料电工纯铁DT4制作导磁片装入磁控装置,试验结果表明,降低了靶面刻蚀不均匀度,靶材利用率提高至少10％.

Transformation of magnetic devices with a magnetic conductive sheet to improve the target utilization

Through detecting the target etching conditions of the vacuum sputtering lines,all production lines were found to have different degrees of etching nonhomogeneity of the target surface,especially line 3,the etching trench depth of the end is deeper than other parts,causing shorter life and lower utilization of the target.Test results showed that placing the magnetic conductive sheet made of electrical pure iron DT4 with high permeability into the magnetic device,the etching nonhomogeneity of the target surf...