| 磁控反应溅射AIN薄膜光学性能研究 |
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| 引用本文： | 朱春燕,朱昌. 磁控反应溅射AIN薄膜光学性能研究[J]. 表面技术, 2008, 37(1): 17-18,31 |
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| 作者姓名： | 朱春燕 朱昌 |
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| 作者单位： | 西安工业大学光电工程学院,陕西,西安,710032 |
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| 基金项目： | 西安工业大学校科研和校改项目 |
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| 摘 要： | 为了制备光学性能良好的AlN薄膜.采用磁控反应溅射法制备了氮化铝(AlN)薄膜,利用椭圆仪、分光光度计、傅立叶变换光谱仪对AlN薄膜进行了相关光学性能的分析.结果表明:在波长为400～1100nm时,AlN薄膜的折射率为2.0～2.4,透过率都在88%以上;在200～300nm远紫外光范围内,薄膜具有强烈的吸收;在红外吸收光谱中,677cm-1处存在1个强烈的吸收峰,说明薄膜中已经形成了AlN.
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| 关 键 词： | 氮化铝薄膜 折射率 透过率 红外光谱 磁控反应溅射法 |
| 文章编号： | 1001-3660（2008）01-0017-02 |
| 收稿时间： | 2007-09-10 |
| 修稿时间： | 2007-09-10 |
The Optical Properties of AIN film by Magnetron Reactive Sputtering |
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| ZHU Chun-yan and ZHU Chang. The Optical Properties of AIN film by Magnetron Reactive Sputtering[J]. Surface Technology, 2008, 37(1): 17-18,31 |
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| Authors: | ZHU Chun-yan and ZHU Chang |
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| Affiliation: | School of Optoelectronic Engineering, Xian Technological University, Xian 710032, China and School of Optoelectronic Engineering, Xian Technological University, Xian 710032, China |
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| Abstract: | Aluminum nitride( AIN) thin film using magnetron reactive sputtering were studied by spectroscopic ellipsometry, ultraviolet-visible spectrometry and FTIR spectrometry. The refractive index of the film is 2. 0-2. 4 in the wavelength range from 400nm to llOOnm. The AIN film has an intense absorption in the far ultraviolet ray range of 200nm-300nm, and high transmission in the wavelength range of 400nm-760nm. An intense absorption exists at 677 cm-l of wavelength in the FTIR spectrum, it is shown that the film comes into being aluminum nitride. |
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| Keywords: | AlN film Refractive index Transmission FTIR spectrum Magnetron reactive sputtering |
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