Chemical etching of ZnSe crystals |
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| Authors: | Hitoshi Tamura Yasuo Okuno Hiroyuki Kato |
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| Affiliation: | (1) Graduate School of Science and Technology, Niigata University, 8050 Igarashinino-cho, 950-21 Niigata-shi, Niigata, Japan;(2) Kanagawa Academy of Science and Technology, 3-2-1 Sakado, Takatsu-ku, 213 Kawasaki-shi, Kanagawa, Japan |
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| Abstract: | Our report describes a newly developed chemical etchant suitable for producing mirror-like ZnSe surfaces. A mirror surface
without any scratch obtained through lapping and polishing was produced by etching in a KMnO4(100 mg)/ H2SO4(10 ml)/H2O(40 ml) solution. The etching rate of ZnSe used in this case was about 1 um/min. The etchant could be applied to crystals
with (lll)A, (lll)B, and (100) faces and the etching rate similar for each face. The value of the full width at half maximum
in the x-ray rocking curve decreased by half after etching with the KMnO4-system etchant. |
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| Keywords: | Chemical etching mirror surface ZnSe |
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