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Laser-induced breakdown in crystalline and amorphous SiO2
Authors:Soileau  M Bass  M
Affiliation:Michelson Laboratory, Naval Weapons Center, China Lake, CA, USA;
Abstract:The 1.06 μm breakdown thresholds of crystalline and amorphous SiO2were compared. These materials showed dependences of the breakdown threshold on the focal volume which are consistent with a multiphoton-assisted electron avalanche damage mechanism.
Keywords:
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