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Small-signal performance and modeling of sub-50 nm nMOSFETs with fT above 460-GHz
Authors:V Dimitrov  JB Heng  K Timp  O Dimauro  R Chan  M Hafez  J Feng  T Sorsch  W Mansfield  J Miner  A Kornblit  F Klemens  J Bower  R Cirelli  EJ Ferry  A Taylor  M Feng  G Timp  
Affiliation:

aUniversity of Illinois at Urbana-Champaign, Electrical and Computer Engineering, 3041 Beckman Institute, 405 N Mathews, Urbana, IL 61801, United States

bNew Jersey Nanotechnology Consortium, Murray Hill, NJ 07974, United States

Abstract:We have fabricated and tested the performance of sub-50 nm gate nMOSFETs to assess their suitability for mixed signal applications in the super high frequency (SHF) band, i.e. 3–30 GHz. For a 30 nm × 40 μm × 2 device, we found fT = 465 GHz at Vds = 2 V, Vg = 0.67 V, which is the highest cut-off frequency reported for a MOSFET produced on bulk silicon substrate so far. However, our measurements of fmax and noise figure indicate that parasitics impose limitations on SHF operation. We also present a high frequency ac model appropriate to sub-50 nm gate length nanotransistors, which incorporates the effects of the parasitics. The model accurately accounts for measurements of the S- and Y-parameters in the frequency range from 1 to 50 GHz.
Keywords:
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