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Irregular shaping of polystyrene nanosphere array by plasma etching |
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| Authors: | Hao Luo Tingting Liu Jun Ma Wei Wang Heng Li Pengwei Wang Jintao Bai Guangyin Jing |
| Affiliation: | 1. Nano Biophotonics Center, National Key Laboratory and Incubation Base of Photoelectric Technology and Functional Materials, Department of Physics, Northwest University, 710069, Xi’an, China 2. School of Physics, Peking University, Beijing, 100871, China 3. Northwest Institute for Nonferrous Metal Research (NIN), 710016, Xi’an, China 4. Institute of Photonics and Photon-Technology, and Provincial Key Laboratory of Photoelectronic Technolony of Northwest University, 710069, Xi’an, China |
| Abstract: | The morphology of nanospheres is crucial for designing the nanofabrication in the nanosphere lithography. Here, by plasma etching, the controllable tailoring of the nanosphere is realized and its morphology dependence on the initial shape, microscopic roughness, and the etching conditions is investigated quantitatively. The results show that the shape evolution strongly depends on the etching gas, power, and process duration. Particularly, the aspect ratio (diameter/height) significantly increases with violent etching, turning the spherical shape into tiny ellipsoidal nanoparticles. The findings are practical to the protocol of non-uniform etching of nanoobjects and provide the useful design tool for the device fabrication at nanoscale. |
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