Simple technologies for fabrication of low-loss silica waveguides |
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| Authors: | Lai Q. Gu J.S. Smit M.K. Schmid J. Melchior H. |
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| Affiliation: | Inst. of Quantum Electron., Swiss Federal Inst. of Technol. Zurich, Switzerland; |
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| Abstract: | A simple and reproducible technology is developed for the fabrication of low-loss silica waveguides on silicon substrates. The guiding layer is formed by changing the Si-O ratio composition of the SiO/sub 2/ layer. The waveguides can be made to have a good match to either optical fibres or guided-wave devices in III-V compound semiconductors.<> |
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